Nanomeasuring & Nanopositioning Machines

Nanomeasuring machine from the top

 

Nanomeasuring and nanopositioning systems are for positioning, manipulating, processing and measuring objects with nanometer accuracy. 

The NMM-1 nanomeasuring system has a special sensor arrangement that ensures a measurement free of aberrations in all three coordinate axes.  The light from one stabilized laser is transmitted from the electronics unit to the interferometer heads via optical fibers.  This results in a compact and temperature-stable system.

The NPP-1 nanopositioning platform is a planar laser interferometric measurement and positioning system for AFM.

These two nanomeasuring and nanopositioning systems are ideal for research/development efforts.

Nanomeasuring Machine Featured Models:

Nanomeasuring machine by SIOS

Nanomeasuring Machine, NMM-1

This system incorporates laser focus sensors, atomic force microscopes, white light sensors and 3D micro scanners.  Features include:

  • Measuring range of 25 x 25 x 5 mm
  • Resolution of 0.1 nm
  • Highest accuracy 3D positioning and measuring system
  • Open device architecture enables application of customized sensors
  • The NMM-1 is controlled via PC software. User API is available

The NMM-1 is designed with a special sensor arrangement that ensures a measurement free of aberrations in all three coordinate axes.  The measuring axes of three miniature interferometers intersect virtually at the point of contact between the probing sensor and the measured object.

The light from one stabilzed laser is transmitted from the electronics unit to the interferometer heads via optical fibers.  This results in a compact and temperature-stable design of the nanopositioning and measuring machine.

For more details in North America, contact Yuri Toegemann at yuri.toegemann@sios.de

Nanopositioning Platform, NPP-1

This system allows for the positioning, manipulation, processing and measurement of objects of microelectronics, micro mechanics, and optics.  Features & benefits include:

  • 2.5 D positioning and measuring system of the highest accuracy
  • Measurement and positioning range: Surface Ø 100 mm
  • Lateral measurement resolution ≤ 0.02 nm
  • Control:  3 fiber-coupled differential interferometers
  • Metrological repeatability by using the HeNe lasers at 633 nm as the light source for the interferometers
  • Atomic force microscopes as probing measuring system, others on request
  • Open device architecture enables application of customer-specific sensors
  • Controlled via PC software.  A user API is available.

The NPP-1 is designed so that the measurement object is placed directly on a moving mirror.  The position and the rotation of the mirror are detected interferometrically.  Ultra stable interferometers are used in this system.  The light from a stabilized laser is transmitted via optical fibers from the electronics unit to the interferometer heads.  This results in the compact and temperature stable design.

For more details in North America, contact Yuri Toegemann at yuri.toegemann@sios.de

in cooperation with:

SIOS Meßtechnik GmbH

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